The programme committee is pleased to announce the following invited speakers, who will give their presentations on the following subjects :

MIDEM 2003 Conference:

Miran Mozetic
Plasma laboratory, Institute of Surface Engineering and Optoelectronics, Ljubljana, Slovenia

Advanced plasma technologies in electronic industry

Application of novel materials, higher standards and demands for environment protection have lead to introduction of novel advanced methods for materials processing. Most of them are dry and run under heavily non-equilibrium conditions. A mixture of gas is transformed into the state of plasma. Molecules are excited, dissociated and ionized and the resultant radicals are used to treat electronic components. Examples of technologies include chemical plasma cleaning, plasma activation, selective plasma etching and plasma ashing. Chemical plasma cleaning has been introduced in microelectronics as an alternative to physical plasma cleaning, whose drawback is a re-deposition of sputtered material. In classical electronic industry, the chemical plasma cleaning has been introduced as an environmentally benign alternative to wet chemical cleaning. Plasma activation has become the most efficient method for a dramatic increase of the polymers wettability and thus affinity to metallization. Selective plasma etching is an excellent method for treatment of polymer-matrix composites prior to metallization, while plasma ashing is a simple and reliable method for organic dust removal. Some examples of industrial application of above technologies will be presented. Advantages as well as drawbacks and limitations of the technologies will be discussed.

Josef Sikula
Brno University of Technology, Brno, Czech Republic

Noise and non-linearity as reliability indicators of electronic devices

An application of noise and non-linearity measurements in analysis, diagnostics and prediction of reliability of electronic devices will be discussed. The sensitivity of noise and non-linearity to the device defects and other irregularities is typical feature of these methods. We will show the principle of noise and non-linearity measuring set-up. Conceptions excess 1/f noise, burst or RTS noise, thermal noise, third harmonic voltage, and third harmonic index will be introduced, and their explanation will be done. Possible reliability indicators for MOSFETs, quantum dots, conducting film resistors, capacitors and single crystals will be presented.

For the Abstracts listed in the Workshop section please click one of the above links (click the corresponding Abstract title)
or go to the Workshop main page.